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    Mass loss from a stretching semitransparent sheet of liquid tin Article

    Phys. Rev. Appl., 13(2), 024035: 1-10.

    B. Liu (Bo), D. Kurilovich (Dmitry), H. Gelderblom (Hanneke) and O.O. Versolato (Oscar)

    February 2020
    open access
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    Generation and characterization of focused helical x-ray beams Article

    Sci. Adv., 6(7), eaax8836: 1-6.

    L. Loetgering (Lars), M. Baluktsian (Margarita), K. Keskinbora (Kahraman), R. Horstmeyer (Roarke), T. Wilhein (Thomas), G. Schütz (Gisela), K.S.E. Eikema (Kjeld) and S. Witte (Stefan)

    February 2020
    open access
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    Quantum key establishment via a multimode fiber Article

    Optics Express, 28(5), 5965-5981.

    L.V. Amitonova (Lyubov), T.B.H. Tentrup (Tristan), I.M. Vellekoop (Ivo) and P.W.H. Pinkse (Pepijn)

    February 2020
    open access
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    Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst Article

    Nanoscale, 12(10), 5866-5875.

    Z. Jakub (Zdenek), J. Hulva (Jan), P.T.P. Ryan (Paul), D.A. Duncan (David), D.J. Payne (David), R. Bliem (Roland), M. Ulreich (Manuel), P. Hofegger (Patrick), F. Kraushofer (Florian), M. Meier (Matthias), et al. M. Schmid (Michael), U. Diebold (Ulrike) and G.S. Parkinson (Gareth)

    February 2020
    open access
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    On the Origin of Frictional Energy Dissipation Article

    Tribol. Lett., 68(1), 8: 1-13.

    R. Hu (Renfeng), S.Yu. Krylov (Sergey) and J.W.M. Frenken (Joost)

    March 2020
    open access
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    Fourier ptychography: current applications and future promises Article

    Opt. Express, 28(7), 9603-9630.

    P.C. Konda (Pavan Chandra), L. Loetgering (Lars), K.C. Zhou (Kevin), S. Xu (Shiqi), A.R. Harvey (Andrew) and R. Horstmeyer (Roarke)

    March 2020
    open access
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    zPIE: an autofocusing algorithm for ptychography Article

    Opt. Lett., 45(7), 2030-2033.

    L. Loetgering (Lars), M. Du (Mengqi), K.S.E. Eikema (Kjeld) and S. Witte (Stefan)

    March 2020
    open access
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    Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications Article

    Appl. Surf. Sci., 144951: 1-10.

    M. Saedi (Mehdi), C. Sfiligoj (Cristina), J. Verhoeven (Jan) and J.W.M. Frenken (Joost)

    March 2020
    open access
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