ACS Mater. Au

Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance Article

N. Thakur (Neha), M. Vockenhuber (Michaela), Y. Ekinci (Yasin), B. Watts (Benjamin), A. Giglia (Angelo), N. Mahne (Nicola), S. Nannarone (Stefano), S. Castellanos Ortega (Sonia) and A.M. Brouwer (Albert)