Plasma Sources Sci. Technol.
Collection
Collection
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Sn ion energy distributions of ns- and ps-laser produced plasmas Article
Plasma Sources Sci. Technol., 045001:1-8.A. Bayerle (Alex), M.J. Deuzeman, S. van der Heijden, D. Kurilovich (Dmitry), T. de Faria Pinto (Tiago), A. Stodolna, S. Witte (Stefan), K.S.E. Eikema (Kjeld), W.M.G. Ubachs (Wim), R. Hoekstra (Ronnie), et al. O.O. Versolato (Oscar)
April 2018 -
Physics of laser-driven tin plasma sources of EUV radiation for nanolithography Article
Plasma Sources Sci. Technol., 28(8), 083001:1-17.July 2019 -
High-energy ions from Nd:YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model Article
Plasma Sources Sci. Technol., 30(10), 105006: 1-10.D.J. Hemminga (Diko), L. Poirier (Lucas), M.M. Basko (Mikhail), R. Hoekstra (Ronnie), W.M.G. Ubachs (Wim), O.O. Versolato (Oscar) and J. Sheil (John)
October 2021 -
Evidence of production of keV Sn<sup>+</sup> ions in the H<sub>2</sub> buffer gas surrounding an Sn-plasma EUV source Article
Plasma Sources Sci. Technol., 32(3), 035006: 1-9.S. Rai (Subam), K. Bijlsma (Klaas), L. Poirier (Lucas), E. de Wit (Emiel), L. Assink (Luc), A.C. Lassise (Adam), I. Rabadán (Ismanuel), L. Méndez (Luis), J. Sheil (John), O.O. Versolato (Oscar), et al. R. Hoekstra (Ronnie)
March 2023 -
Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 \textmu m-wavelength laser for future EUV lithography Article
Plasma Sources Sci. Technol., 33(10), 105003: 1-14.S.J.J. de Lange (Stan Johannes), D.J. Hemminga (Diko), Y. Mostafa (Yahia), R.A. Meijer (Randy Anthonius), O.O. Versolato (Oscar) and J. Sheil (John)
September 2024