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SPIE-Intl Soc Optical Eng
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Advances in Patterning Materials and Processes XL 12498
Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography
Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D
Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205305
Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII
Journals
J. Micro/Nanopattern. Mater. Metrol.
J. of Micro/Nanolithography. MEMS and MOEMS
Neurophotonics
Nonlinear Frequency Generation and Conversion: Materials and Devices, 116700 (5 March 2021)
Proc. SPIE 11886, International Conference on X-Ray Lasers 2020
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