Extreme ultraviolet multispectral ptychography with minimum entropy beams

2020-12-14

Additional Metadata
Keywords	Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials
Publisher	OSA Publishing
Persistent URL	dx.doi.org/10.1364/optica.410007
Journal	Optica
Organisation	EUV Generation & Imaging
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Loetgering, L, Witte, S, Liu, X, de Beurs, A.C.C, Du, M, Kuijper, G, & Eikema, K.S.E. (2020). Extreme ultraviolet multispectral ptychography with minimum entropy beams. Optica. doi:10.1364/optica.410007

Publication