Laser-produced tin plasmas are used for the generation of extreme ultraviolet (EUV) light for state-of-The-Art nanolithography. Currently, CO2-gas lasers operating at 10-micrometer wavelength are used to drive the EUV-emitting plasma but with further developments regarding their output power, solid-state lasers operating at shorter, mid-infrared wavelengths may present a viable alternative. Such novel laser systems may provide a significantly higher efficiency in converting electrical power to laser light. We use an extensive diagnostic toolset to characterize and understand the physics of solid-state-laser-driven plasma light sources at the atomic level. © 2020 OSA - The Optical Society. All rights reserved.

OSA Technical Digest (Optical Society of America)
EUV Plasma Processes

Behnke, L., Schupp, R., Bouza, Z., Scheers, J., Sheil, J., Hoekstra, R., … Versolato, O. (2020). Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation. In OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2. doi:10.1364/euvxray.2020.ef2a.2