Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laser-driven plasma and present a surprising answer to the key question: what makes that light?

IOP Publishing
J. Phys.: Conf. Ser.
EUV Plasma Processes

Versolato, O., Bayerle, A., Bayraktar, M., Behnke, L., Bekker, H., Bouza, Z., … Witte, S. (2020). Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography. J. Phys.: Conf. Ser., 1412(19), 192006:1–1. doi:10.1088/1742-6596/1412/19/192006