2020-06-11
Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography
Publication
Publication
J. Phys.: Conf. Ser. , Volume 1412 - Issue 19 p. 192006:1- 1
Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laser-driven plasma and present a surprising answer to the key question: what makes that light?
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| IOP Publishing | |
| doi.org/10.1088/1742-6596/1412/19/192006 | |
| J. Phys.: Conf. Ser. | |
| Organisation | EUV Plasma Processes |
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Versolato, O., Bayerle, A., Bayraktar, M., Behnke, L., Bekker, H., Bouza, Z., Colgan, J., Crespo López-Urrutia, J. R., Deuzeman, M. J., Hoekstra, R., Kurilovich, D., Liu, B., Meijer, R. A., Neukirch, A., Poirier, L., Rai, S., Ryabtsev, A., Scheers, J., Schupp, R., Sheil, J., Torretti, F., Ubachs, W.& Witte, S. (2020). Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography. J. Phys.: Conf. Ser., 1412(19), 192006:1–1.https://doi.org/10.1088/1742-6596/1412/19/192006 |
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