Tin-oxo cage materials are of interest for use as photoresists for EUV (Extreme­ Ultraviolet) lithography (13.5 run, 92 eV), owing to their large absorption cross section for EUV light. In this work we exposed an n-butyl tin-oxo cage dication in the gas phase to photons in the energy range 4-14 eV to explore its fundamental photoreactivity. At all energies above the onset of electronic absorption at 5 eV (250 run) cleavage of tin-carbon bonds was observed. With photon energies >12 eV (<103 run) photoionization can occur, leading to 3+ ions. Besides the higher charge promotion, butyl chain loss without electron ejection (leading to 2+ fragments) still occurs. Keywords: Tin-oxo cage, Photoresist, Mass spectrometry, Photochemistry

Additional Metadata
Publisher SPTS
Funder NWO , ASML
Persistent URL dx.doi.org/10.2494/photopolymer.31.243
Journal J. Photopolymer. Sci.Tec.
Haitjema, J, Wu, L, Giuliani, A, Nahon, L, Castellanos, S, & Brouwer, A.M. (2018). Photo-Induced Fragmentation of a Tin-Oxo Cage Compound. J. Photopolymer. Sci.Tec., 31(2), 243–247. doi:10.2494/photopolymer.31.243