Developments for broadband spectral and spatial characterization of tin plasma light sources for EUV lithography

This Thesis explored the spectral and spatial characteristics of laser-driven plasma sources of EUV light. The work reported in this Thesis mainly focused on the out-of-band radiation produced by tin laser-produced plasma, in contrast to most of the available literature – which covers mostly the wavelength range close to the in-band radiation near 13.5 nm. Out-of-band radiation can provide key insights into the production of EUV light, and is by itself of particular interest as certain wavelength ranges may be detrimental to the lithography processes. For our work, we carefully calibrated the intensity response of a transmission grating spectrometer and added novel imaging capabilities to the spectrometer.

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