RSC
NWO , ERC
doi.org/10.1039/C8TC05273E
J.Mater.Chem.C
EUV Photoresists-Former Group

Wu, L, Tiekink, M, Giuliani, A, Nahon, L, & Castellanos, S. (2019). Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications. J.Mater.Chem.C, 7(1), 33–37. doi:10.1039/C8TC05273E