Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

2019-01-07

J. Mater. Chem. C , Volume 7 - Issue 1 p. 33- 37

Additional Metadata
Publisher	Royal Society of Chemistry (RSC)
Funder	Netherlands Organisation for Scientific Research (NWO) , European Research Council (ERC)
Persistent URL	doi.org/10.1039/C8TC05273E
Journal	J. Mater. Chem. C
Organisation	EUV Photoresists-Former Group
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Wu, L., Tiekink, M., Giuliani, A., Nahon, L., & Castellanos Ortega, S. (2019). Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications. J. Mater. Chem. C, 7(1), 33–37. doi:10.1039/C8TC05273E

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