2019-01-07
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
Publication
Publication
J. Mater. Chem. C , Volume 7 - Issue 1 p. 33- 37
Additional Metadata | |
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RSC | |
NWO , ERC | |
doi.org/10.1039/C8TC05273E | |
J. Mater. Chem. C | |
Organisation | EUV Photoresists-Former Group |
Wu, L., Tiekink, M., Giuliani, A., Nahon, L., & Castellanos Ortega, S. (2019). Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications. J. Mater. Chem. C, 7(1), 33–37. doi:10.1039/C8TC05273E |