2018-07-07
Formation of a monolayer h-BN nanomesh on Rh (111) studied using in-situ STM
Publication
Publication
Sci. China-Phys. Mech. Astron. , Volume 61 - Issue 7 p. 076811: 1- 6
As a member of the 2D family of materials,h-BN is an intrinsic insulator and could be employed as a dielectric or insulatinginter-layer in ultra-thin devices. Monolayerh-BN can be synthesized on Rh (111) surfaces using borazine as a precursor. Usingin-situvariable-temperature scanning tunneling microscopy (STM), we directly observed the formation ofh-BN in real-time. Byanalyzing the deposition under variable substrate temperatures and the filling rate of theh-BN overlayer vacant hollows duringgrowth, we studied the growth kinetics of how the borazine molecules construct theh-BN overlayer grown on the Rh surface.
Additional Metadata | |
---|---|
Science China Press | |
doi.org/10.1007/s11433-017-9169-7 | |
Sci. China-Phys. Mech. Astron. | |
Organisation | Nanolayers-Former Group |
Dong, G. C., Zhang, Y., & Frenken, J. (2018). Formation of a monolayer h-BN nanomesh on Rh (111) studied using in-situ STM. Sci. China-Phys. Mech. Astron., 61(7), 076811: 1–6. doi:10.1007/s11433-017-9169-7 |