Observation of double electron capture by Sn ions from H$_2$ using reaction microscopy

Ion interactions are an interesting subject to study due to their relevance in state of the art EUV lithography machines. ASML is a major player in the semiconductor industry because they are able to produce machines that produce the smallest features on wavers. ASML is always trying to further optimise and comprehend the processes taking part in their machines. This paper looks into the effect of hydrogen on moving tin ions. This is relevant because ASML has a tin plasma in their most recent machines that produces the extreme ultra violet light used for the lithography. This tin plasma also produces tin ion projectiles that should not interfere with the rest of the machine. Hydrogen is used to protect the machine and transport the tin away. This paper looks into a measurement apparatus that will be able to determine the energy release as a consequence of double capture charge transfer of tin ions from molecular hydrogen. Previous work has been done on the subject which revealed inconsistencies in the results for Sn3+. This setup will be able to give more insight in these processes. The device is a reaction microscope which allows us to take Time of Flight(ToF) and position data at the same time. The aim of this project is to establish a basic functioning of the device and to acquire and analyse first data. The focus in this thesis will lay on the analysis and will be concluded with recommendations and outlook for the project. We can conclude that the reaction microscope is operational and has provided valuable data. The double capture observed shows 9.7 eV hydrogen fragments as theory suggests. The reaction microscope will have to be improved further but shows great promise.