Organotin Photoresists for extreme ultraviolet lithography

Additional Metadata
Promotor	A.M. Brouwer (Albert) , P.C.M. Planken (Paul) , S. Castellanos (Sonia)
Degree Grantor	University of Amsterdam
Organisation	Nanophotochemistry
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Zhang, Y. (2019, April 11). Organotin Photoresists for extreme ultraviolet lithography.

Additional Files
2019_Zhang.jpg Cover Image , 79kb

Publication