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Y. Zhang (Yu)

2019-04-11

Organotin Photoresists for extreme ultraviolet lithography

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Promotor A.M. Brouwer (Albert) , P.C.M. Planken (Paul) , S. Castellanos Ortega (Sonia)
Degree Grantor University of Amsterdam
Organisation Nanophotochemistry-Former Group
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Zhang, Y. (2019, April 11). Organotin Photoresists for extreme ultraviolet lithography.

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2019_Zhang.jpg Cover Image , 79kb

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