Organotin Photoresists for extreme ultraviolet lithography

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Promotor	A.M. Brouwer (Albert) , P.C.M. Planken (Paul) , S. Castellanos Ortega (Sonia)
Degree Grantor	University of Amsterdam
Organisation	Nanophotochemistry-Former Group
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Zhang, Y. (2019, April 11). Organotin Photoresists for extreme ultraviolet lithography.

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