2019-12-19
Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography
Publication
Publication
This thesis aims to further the understanding of the Sn ions responsible for emis-sion of 13.5 nm radiation in laser-produced-plasma EUV sources for the nano-lithographic industry.
| Additional Metadata | |
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| W.M.G. Ubachs (Wim) , R. Hoekstra (Ronnie) , O.O. Versolato (Oscar) | |
| NWO | |
| VU University Amsterdam | |
| Organisation | EUV Plasma Processes |
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Torretti, F. (2019, December 19). Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography.
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