We report on an approach for quantitative characterization of laser beam quality, wavefronts, and lens aberrations using ptychography with a near-infrared supercontinuum laser. Ptychography is shown to offer a powerful alternative for both beam propagation ratio M2 and wavefront measurements compared with existing techniques. In addition, ptychography is used to recover the transmission function of a microlens array for aberration analysis. The results demonstrate ptychography’s flexibility in wavefront metrology and optical shop testing.

Additional Metadata
Keywords Atomic and Molecular Physics, and Optics
Funder NWO , ERC
Persistent URL dx.doi.org/10.1364/oe.385191
Journal Opt. Express
Citation
Du, M, Loetgering, L, Eikema, K.S.E, & Witte, S. (2020). Measuring laser beam quality, wavefronts, and lens aberrations using ptychography. Opt. Express, 28(4), 5022–5034. doi:10.1364/oe.385191