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Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films. Article
Cryst. Growth Des., 20(8), 5302-5309.O.C.M. Lugier (Olivier), U. Pokharel (Unnati) and Castellanos, Sonia
June 2020 -
Laser-induced periodic surface structures: Arbitrary angles of incidence and polarization states Article
Phys. Rev. B, 101(24), 245430: 1-15.H. Zhang (Hao), J.-P. Colombier (Jean-Philippe) and S. Witte (Stefan)
June 2020
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Directed Emission from Self‐Assembled Microhelices Article
Adv. Funct. Mater., 30(26), 1908218: 1-5.L. Helmbrecht (Lukas), M. Tan (Melissa), R. Röhrich (Ruslan), Bistervels, Marloes H., B.O. Kessels (Bruno Ortiz), A.F. Koenderink (Femius), B. Kahr (Bart) and W.L. Noorduin (Willem)
June 2020 -
Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In Proceedings
C. Messinis (Christos), T.T.M. van Schaijk (Theodorus), V.T. Tenner (Vasco), J.F. de Boer (Johannes), S. Witte (Stefan) and A.J. den Boef (Arie)
June 2020 -
Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers Article
J. Photopolym. Sci. Technol., 33(2), 229-234.O.C.M. Lugier (Olivier), A. Troglia (Alessandro), N. Sadegh (Najmeh), L. van Kessel (Luc), R. Bliem (Roland), N. Mahne (Nicola), S. Nannarone (Stefano) and S. Castellanos Ortega (Sonia)
July 2020
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Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications Article
J. Photopolym. Sci. Technol., 33(2), 153-158.N. Thakur (Neha), A. Giuliani (Alexandre), L. Nahon (Laurent) and S. Castellanos Ortega (Sonia)
July 2020
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XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy Article
J. Photopolymer. Sci.Tec., 33(2), 145-151.N. Sadegh (Najmeh), M.L.S. van der Geest (Maarten), J. Haitjema (Jarich), F. Campi (Filippo), S. Castellanos Ortega (Sonia), P.M. Kraus (Peter) and A.M. Brouwer (Albert)
July 2020
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Photoinduced and Thermal Single‐Electron Transfer to Generate Radicals from Frustrated Lewis Pairs Article
Chem. Eur. J., 26(41), 9005-9011.F. Holtrop (Flip), A.R. Jupp (Andrew), N.P. van Leest (Nicolaas), M. Paradiz Dominguez (Maximilian), R.M. Williams (René), A.M. Brouwer (Albert), B. de Bruin (Bas), A.W. Ehlers (Andreas) and J.C. Slootweg (Chris)
July 2020