-
Stabilizing Cobalt‐free Li‐rich Layered Oxide Cathodes through Oxygen Lattice Regulation by Two‐phase Ru Doping Article
Angew. Chem. Int. Ed., 62(5), e20221380: 1-9.Y.M. Fan (Yameng), E. Olsson (Emilia), G.M. Liang (Gemeng), Z.J. Wang (Zhijie), A.M. D'Angelo (Anita), B. Johannessen (Bernt), L. Thomsen (Lars), B. Cowie (Bruce), L. Jingxi (Li), F. Zhang (Fangli), et al. Y. Zhao (Yunlong), W.K. Pang (Wei Kong), Q. Cai (Qiong) and Z. Guo (Zaiping)
January 2023
-
Study of the humidity-controlled CeO2 fixed-abrasive chemical mechanical polishing of a single crystal silicon wafer Article
Tribol.Int., 108087: 1-13.G.Z. Li (Gengzhuo), C. Xiao (Chen), S. Zhang (Shibo), S. Luo (Shengquan), Y. Chen (Yuhan) and Y. Wu (Yongbo)
February 2023 -
Probing the low friction mechanism of hydrogen-free DLC film in oxygen and nitrogen environments by first-principles calculations and molecular dynamics simulation Article
Surf. Coat. Technol., 129219: 1-11.Y.H. Liu (Yunhai), H. Zhang (Hu), Y. Luo (Yiyao), L. Wang (Lei) and C. Xiao (Chen)
February 2023 -
Why Teflon is so slippery while other polymers are not Article
Phys. Rev. E, 107(2), 024801: 1-6.T.-D. Terwisscha-Dekker (Hans), T.N. Hogenelst (Tadeus Nikos), R. Bliem (Roland), B. Weber (Bart) and D. Bonn (Daniel)
February 2023 -
High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams Article
Optica, 10(2), 255-263.M. Du (Mengqi), X. Liu (Xiaomeng), A. Pelekanidis (Antonios), F. Fengling (Fengling), L. Loetgering (Lars), P. Konold (Patrick), C.L. Porter (Christina), P. Smorenburg (Peter), K.S.E. Eikema (Kjeld) and S. Witte (Stefan)
February 2023
-
Molecular Probing of the Stress Activation Volume in Vapor Phase Lubricated Friction Article
ACS Appl. Mater. Interfaces, 15(9), 12603-12608.C.-C. Hsu (Chao-Chun), L. Peng (Liang), F.-C. Hsia (Feng-Chun), B. Weber (Bart), D. Bonn (Daniel) and A.M. Brouwer (Albert)
February 2023
-
February 2023 -
Evidence of production of keV Sn<sup>+</sup> ions in the H<sub>2</sub> buffer gas surrounding an Sn-plasma EUV source Article
Plasma Sources Sci. Technol., 32(3), 035006: 1-9.S. Rai (Subam), K. Bijlsma (Klaas), L. Poirier (Lucas), E. de Wit (Emiel), L. Assink (Luc), A.C. Lassise (Adam), I. Rabadán (Ismanuel), L. Méndez (Luis), J. Sheil (John), O.O. Versolato (Oscar), et al. R. Hoekstra (Ronnie)
March 2023