Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography February 2018 - March 2018

Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists In Proceedings

S. Castellanos Ortega (Sonia), L. Wu (Lianjia), M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber (Michaela), Y. Ekinci (Yasin) and T. Jung