Advances in Patterning Materials and Processes XL 12498
Collection
Collection
Published by SPIE-Intl Soc Optical Eng
SPIE Advanced Lithography + Patterning
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Influence of the anion in tin-based EUV photoresists properties In Proceedings
Q. Evrard (Quentin), N. Sadegh (Najmeh), C.-C. Hsu (Chao-Chun), N. Mahne (Nicola), A. Giglia (Angelo), S. Nannarone (Stefano), Y. Ekinci (Yasin), M. Vockenhuber (Michaela), A. Nishimura (Akira), T. Goya (Tsuyoshi), et al. T. Sugioka (Takuo) and A.M. Brouwer (Albert)
April 2023