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Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D February 2019 - February 2019

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Published by SPIE-Intl Soc Optical Eng

Zinc-based metal oxoclusters: towards enhanced EUV absorptivity In Proceedings

N. Thakur (Neha), M. Vockenhuber (Michaela), Y. Ekinci (Yasin) and S. Castellanos Ortega (Sonia)

March 2019
The role of the organic shell in hybrid molecular materials for EUV lithography In Proceedings

L. Wu (Lianjia), M. Vockenhuber (Michaela), Y. Ekinci (Yasin) and S. Castellanos Ortega (Sonia)

March 2019

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