J. of Micro/Nanolithography. MEMS and MOEMS
Collection
Collection
- ISSN: 1932-5134
Published by SPIE-Intl Soc Optical Eng
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Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy Article
J. of Micro/Nanolithography. MEMS and MOEMS, 16(2), 123510: 1-7.Y. Zhang (Yu), J. Haitjema (Jarich), X. Liu (Xiaomeng), F.O.L. Johansson (Fredrik), A. Lindblad (Andreas), S. Castellanos Ortega (Sonia), N. Ottosson (Niklas) and A.M. Brouwer (Albert)
June 2017
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Extreme ultraviolet patterning of tin-oxo cages Article
J. of Micro/Nanolithography. MEMS and MOEMS, 16(3), 033510:1-7.J. Haitjema (Jarich), Y. Zhang (Yu), M. Vockenhuber (Michaela), D. Kazazis, Y. Ekinci (Yasin) and A.M. Brouwer (Albert)
September 2017
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Absorption coefficient of metal-containing photoresists in the extreme ultraviolet Article
J. of Micro/Nanolithography. MEMS and MOEMS, 17(2), 023505: 1-7.R. Fallica, J. Haitjema (Jarich), L. Wu (Lianjia), S. Castellanos Ortega (Sonia), A.M. Brouwer (Albert) and Y. Ekinci (Yasin)
May 2018 -
Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists Article
J. of Micro/Nanolithography. MEMS and MOEMS, 18(1)L. Wu (Lianjia), M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber (Michaela), T. Jung, Y. Ekinci (Yasin) and S. Castellanos Ortega (Sonia)
February 2019 -
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters Article
J. of Micro/Nanolithography. MEMS and MOEMS, 18(4), 043504: 1-11.N. Thakur (Neha), L.T. Tseng (Li-Ting), M. Vockenhuber (Michaela), Y. Ekinci (Yasin) and S. Castellanos Ortega (Sonia)
November 2019