IOP Publishing
ASML, ARCNL, VU, UvA, RUG, NWO
doi.org/10.1088/1361-6595/ad7c7c
Plasma Sources Sci. Technol.
Plasma Theory and Modeling

de Lange, S. J., Hemminga, D., Mostafa, Y., Meijer, R. A., Versolato, O., & Sheil, J. (2024). Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 \textmu m-wavelength laser for future EUV lithography. Plasma Sources Sci. Technol.. doi:10.1088/1361-6595/ad7c7c