Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 \textmu m-wavelength laser for future EUV lithography

2024-09-18

Additional Metadata
Publisher	IOP Publishing
Funder	ASML, ARCNL, VU, UvA, RUG, NWO
Persistent URL	doi.org/10.1088/1361-6595/ad7c7c
Journal	Plasma Sources Sci. Technol.
Rights	CC-BY
Organisation	Plasma Theory and Modeling
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	de Lange, S. J., Hemminga, D., Mostafa, Y., Meijer, R. A., Versolato, O., & Sheil, J. (2024). Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 \textmu m-wavelength laser for future EUV lithography. Plasma Sources Sci. Technol.. doi:10.1088/1361-6595/ad7c7c

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