2024-09-18
Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 \textmu m-wavelength laser for future EUV lithography
Publication
Publication
Additional Metadata | |
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IOP Publishing | |
ASML, ARCNL, VU, UvA, RUG, NWO | |
doi.org/10.1088/1361-6595/ad7c7c | |
Plasma Sources Sci. Technol. | |
Organisation | Plasma Theory and Modeling |
de Lange, S. J., Hemminga, D., Mostafa, Y., Meijer, R. A., Versolato, O., & Sheil, J. (2024). Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 \textmu m-wavelength laser for future EUV lithography. Plasma Sources Sci. Technol.. doi:10.1088/1361-6595/ad7c7c |