We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages: molecular building blocks that are known to turn insoluble upon EUV exposure, thus having the properties of a negative tone photoresist. In this work, we focus on contrast curves of the materials using open-frame EUV exposures and their patterning capabilities using EUV interference lithography. It is shown that baking steps, such as post-exposure baking (PEB) can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. In addition, we show that the exchange of the anions of the cage can make a difference in terms of their physical properties. Our results demonstrate the significance of process optimization while evaluating the resist performance of novel molecular materials.

SPIE.
E.M. Panning , K.A. Goldberg
doi.org/10.1117/12.2257911
Proceedings SPIE
Extreme Ultraviolet (EUV) Lithography VIII : conference held in San Jose, California, February 26, 2017
Nanophotochemistry

Haitjema, J, Zhang, Y, Vockenhuber, M, Kazazis, D, Ekinci, Y, & Brouwer, A.M. (2017). Extreme ultraviolet patterning of tin-oxo cages. In E.M Panning & K.A Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VIII : conference held in San Jose, California, February 26, 2017 (Vol. 10143, pp. 1014325: 1–1014325:10). SPIE. doi:10.1117/12.2257911