We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages: molecular building blocks that are known to turn insoluble upon EUV exposure, thus having the properties of a negative tone photoresist. In this work, we focus on contrast curves of the materials using open-frame EUV exposures and their patterning capabilities using EUV interference lithography. It is shown that baking steps, such as post-exposure baking (PEB) can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. In addition, we show that the exchange of the anions of the cage can make a difference in terms of their physical properties. Our results demonstrate the significance of process optimization while evaluating the resist performance of novel molecular materials.

Additional Metadata
Publisher SPIE.
Editor E.M. Panning , K.A. Goldberg
Persistent URL dx.doi.org/10.1117/12.2257911
Series Proceedings SPIE
Journal Extreme Ultraviolet (EUV) Lithography VIII : conference held in San Jose, California, February 26, 2017
Citation
Haitjema, J, Zhang, Y, Vockenhuber, M, Kazazis, D, Ekinci, Y, & Brouwer, A.M. (2017). Extreme ultraviolet patterning of tin-oxo cages. In E.M Panning & K.A Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VIII : conference held in San Jose, California, February 26, 2017 (Vol. 10143, pp. 1014325: 1–1014325:10). SPIE. doi:10.1117/12.2257911