SPIE.
doi.org/10.1117/1.JMM.18.1.013504
J. of Micro/Nanolithography. MEMS and MOEMS
EUV Photoresists-Former Group

Wu, L, Baliozovic, M, Portale, G, Kazazis, D, Vockenhuber, M, Jung, T, … Castellanos, S. (2019). Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists. J. of Micro/Nanolithography. MEMS and MOEMS, 18(1). doi:10.1117/1.JMM.18.1.013504