Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists

2019-02-27

Additional Metadata
Publisher	SPIE-Intl Soc Optical Eng
Persistent URL	doi.org/10.1117/1.JMM.18.1.013504
Journal	J. of Micro/Nanolithography. MEMS and MOEMS
Organisation	EUV Photoresists-Former Group
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Wu, L., Baliozovic, M., Portale, G., Kazazis, D., Vockenhuber, M., Jung, T., … Castellanos Ortega, S. (2019). Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists. J. of Micro/Nanolithography. MEMS and MOEMS, 18(1). doi:10.1117/1.JMM.18.1.013504

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